Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning
Authors:
- Samrina SahirSSSamrina Sahir
- Nagendra Prasad YerriboinaNYNagendra Prasad Yerriboina
- So-Young HanSHSo-Young Han
- Kwang-Min HanKHKwang-Min Han
- Tae-Gon KimTKTae-Gon Kim
- Niraj MahadevNMNiraj Mahadev
- Jin-Goo ParkJPJin-Goo Park
- 1 April 2021
- journal article
- research article
- Published by Elsevier in Applied Surface Science
- Vol. 545
Abstract
No abstract availableKeywords
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