Structural and mechanical properties of titanium–aluminium–nitride films deposited by reactive close-field unbalanced magnetron sputtering

This publication has 30 references indexed in Scilit:

• Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review
  Materials Science and Engineering: A, 2003
• Nanostructure and hardness of titanium aluminum nitride prepared by plasma enhanced chemical vapor deposition
  Thin Solid Films, 2001
• Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arc
  Journal of Vacuum Science & Technology A, 2001
• Phase variation and properties of (Ti, Al)N films prepared by ion beam assisted deposition
  Surface and Coatings Technology, 1997
• Structural analysis of AlN and (Ti1−XAlX)N coatings made by plasma enhanced chemical vapor deposition
  Journal of Applied Physics, 1996
• Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
  Thin Solid Films, 1993
• TiN coatings on mild steel substrates with electroless nickel as an interlayer
  Surface and Coatings Technology, 1991
• The structure and composition of TiZrN, TiAlZrN and TiAlVN coatings
  Materials Science and Engineering: A, 1988
• Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum
  Journal of Vacuum Science & Technology A, 1987
• Titanium aluminum nitride films: A new alternative to TiN coatings
  Journal of Vacuum Science & Technology A, 1986