On the influence of ion energy and incidence angle on Auger depth profiles of binary alloys
Authors:
- 31 December 1982
- journal article
- Published by Elsevier in Applications of Surface Science
- Vol. 10 (1) , 100-114
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- On the phenomenological model of preferred sputtering for SIMS and Auger profiling: A critical analysisSurface Science, 1980
- Preferred sputtering on binary alloy surfaces of the AlPdSi systemSurface Science, 1979
- Influence of atomic mixing and preferential sputtering on depth profiles and interfacesJournal of Vacuum Science and Technology, 1979
- Effects of enhanced diffusion on preferred sputtering of homogeneous alloy surfacesSurface Science, 1978
- Quantitative auger electron analysis of homogeneous binary alloys: Chromium in goldSurface Science, 1977
- Relative sensitivity factors for quantitative Auger analysis of binary alloysSurface Science, 1977
- Surface enrichment of copper due to keV Xe sputtering of an Al-Cu mixtureJournal of Applied Physics, 1976
- The influence of selective sputtering on surface compositionSurface Science, 1976
- Auger study of preferred sputtering on binary alloy surfacesSurface Science, 1976
- Quantitative auger electron spectroscopy analysis of AgPd and NiPd alloysSurface Science, 1975