Quantitative surface analysis of layered materials
Authors:
- 1 April 1992
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 18 (4) , 251-256
Abstract
The effects of concentration variation with depth, C(X) , on the quantitative reduction of electron spectroscopic data is discussed. It is shown that when the concentration varies with depth, quantitation of the data is affected by the escape depth of the electron transitions chosen for quantitation. Therefore, accurate quantitation is impossible without knowledge of C(X) . A Laplace transform method to determine C(X) from angle‐resolved electron spectroscopic data is reviewed, along with potential problems caused by variation with angle of the escape depth of electrons in the solid, channeling, forward scattering, matrix corrections and surface roughness.Keywords
This publication has 30 references indexed in Scilit:
- Formalism for quantitative surface analysis by electron spectroscopyJournal of Vacuum Science & Technology A, 1990
- Precision, accuracy, and uncertainty in quantitative surface analyses by Auger-electron spectroscopy and x-ray photoelectron spectroscopyJournal of Vacuum Science & Technology A, 1990
- Elastic scattering and quantification in AES and XPSSurface and Interface Analysis, 1989
- Composition depth profiles of oxidized silicon and sputtered GaAs from angle-resolved x-ray photoelectron spectroscopyJournal of Vacuum Science & Technology B, 1988
- Quantification and measurement by Auger electron spectroscopy and X-ray photoelectron spectroscopyVacuum, 1986
- Deconvolution of concentration depth profiles from angle resolved x-ray photoelectron spectroscopy dataJournal of Vacuum Science & Technology A, 1985
- A new tool for studying epitaxy and interfaces: The XPS searchlight effectJournal of Vacuum Science & Technology A, 1985
- Matrix effects in quantitative auger analysis of dilute alloysSurface Science, 1979
- Quantitative auger electron analysis of homogeneous binary alloys: Chromium in goldSurface Science, 1977
- Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)Physical Review A, 1972