Mechanical properties of r.f. magnetron sputtered indium tin oxide films
Authors:
- Wen-Fa WuWWWen-Fa Wu
- Bi-Shiou ChiouBCBi-Shiou Chiou
- 1 January 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 293 (1-2) , 244-250
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Effect of oxygen concentration in the sputtering ambient on the microstructure, electrical and optical properties of radio-frequency magnetron-sputtered indium tin oxide filmsSemiconductor Science and Technology, 1996
- Oxygen content of indium tin oxide films fabricated by reactive sputteringJournal of Vacuum Science & Technology A, 1995
- Properties of radio-frequency magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealingThin Solid Films, 1994
- Deposition of Indium Tin Oxide Films on Acrylic Substrates by Radiofrequency Magnetron SputteringJournal of the American Ceramic Society, 1994
- Effect of sputtering power on the structural and optical properties of RF magnetron sputtered ITO filmsSemiconductor Science and Technology, 1994
- Effect of internal stress on adhesion and other mechanical properties of evaporated indium tin oxide (ITO) filmsJournal of Adhesion Science and Technology, 1994
- Electrical behaviour and optical properties of screen-printed ITO thin filmsSemiconductor Science and Technology, 1993
- Superconductivity in transparent Sn-doped In2O3 filmsJournal of Applied Physics, 1993
- Properties of indium tin oxide films prepared by the electron beam evaporation method in relation to characteristics of indium tin oxide/silicon oxide/silicon junction solar cellsJournal of Applied Physics, 1992
- Transparent heat-reflecting coatings based on highly doped semiconductorsThin Solid Films, 1981