Rebecca K. Banner
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Rebecca K. Banner has a total of 26 co-authors. Here are the top co-authors by number of shared publications:
- Michael A. Filler
Georgia Institute of Technology
5 shared publications - Eric M. Vogel
School of Materials Science and Engineering, Georgia Institute of Technology 1 , Atlanta, Georgia 30332
4 shared publications - Kaifan Yue
Robotics Department,Ford Motor Company Robotics Building University of Michigan Ann Arbor Ann Arbor Michigan USA
4 shared publications - Kira Barton
Department of Mechanical Engineering, University of Michigan, Ann Arbor, MI, USA
4 shared publications - Hubert N. Elly
School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, USA
3 shared publications - Siddharth Kurup
School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, USA
3 shared publications
Latest Publications
- Open Access
- 12 March 2026
- Published by Wiley in Advanced Materials Interfaces
- Vol. 13 (12)
High‐Performance, Paper‐Based Microelectronics via a Micromodular Fabrication Process
The integration of high‐performance microelectronics onto flexible, sustainable substrates is important for advancing eco‐friendly technologies. This study presents an approach for creating circuits comprised of silicon micromodular transistors on cellulose nanomaterial (CNM)‐coated paper substrates with silver nanoparticle interconnects formed using electrohydrodynamic jet (e‐jet) printing. The transistors exhibit on/off ratios of ∼10 7 , threshold voltages of 0.00 ± 0.06 V, subthreshold slopes of 102 ± 5 mV/decade, and peak effective mobilities of 430 ± 60 cm 2 V −1 s −1 . Cellulose nanofibril (CNF) and cellulose nanocrystal (CNC) coatings are evaluated for mechanical and electrical performance. CNF‐based coatings offer lower reverse saturation current despite higher surface roughness, while smoother CNC‐based coatings exhibit higher reverse saturation current. Wired micromodular transistors maintain performance under radii of curvature bending strain as small as 2.3 mm. A depletion‐load inverter serves as proof‐of‐concept micromodular circuitry. To the best of our knowledge, this work demonstrates a circuit assembly technique on paper that mitigates many of the trade‐offs of previous paper‐based platforms.
- 12 March 2026
- Published by Wiley in Advanced Materials Interfaces
- Vol. 13 (12)
Open AccessHigh‐Performance, Paper‐Based Microelectronics via a Micromodular Fabrication Process
The integration of high‐performance microelectronics onto flexible, sustainable substrates is important for advancing eco‐friendly technologies. This study presents an approach for creating circuits comprised of silicon micromodular transistors on cellulose nanomaterial (CNM)‐coated paper substrates with silver nanoparticle interconnects formed using electrohydrodynamic jet (e‐jet) printing. The transistors exhibit on/off ratios of ∼10 7 , threshold voltages of 0.00 ± 0.06 V, subthreshold slopes of 102 ± 5 mV/decade, and peak effective mobilities of 430 ± 60 cm 2 V −1 s −1 . Cellulose nanofibril (CNF) and cellulose nanocrystal (CNC) coatings are evaluated for mechanical and electrical performance. CNF‐based coatings offer lower reverse saturation current despite higher surface roughness, while smoother CNC‐based coatings exhibit higher reverse saturation current. Wired micromodular transistors maintain performance under radii of curvature bending strain as small as 2.3 mm. A depletion‐load inverter serves as proof‐of‐concept micromodular circuitry. To the best of our knowledge, this work demonstrates a circuit assembly technique on paper that mitigates many of the trade‐offs of previous paper‐based platforms.
- Open Access
- 27 February 2026
- Published by Wiley in Advanced Materials Technologies
- Vol. 11 (11)
Characterization and Design Framework for Micro‐ and Nanoscale Printed Metal Interconnects in Hybrid Electronic Systems
High‐resolution printing offers promising avenues for packaging micro‐ and nanoscale modular electrical components, enabling hybrid, high‐performance circuits. The miniaturization of component interfaces imposes stringent requirements on printed interconnect resolution, conductivity, and structural robustness. This work systematically investigates the fabrication and characterization of submicron‐to‐micron scale (300 nm–3 ) metal nanoparticle interconnects, focusing on the interplay between printing parameters, multilayer deposition, and thermal sintering conditions. Silver (Ag) and gold (Au) colloidal inks are printed with controlled cross‐sectional geometries and sintered under dry air, forming gas, and nitrogen atmospheres. Correlations between geometry, sintering atmosphere, and interconnect resistivity reveal that oxygen‐rich and reducing environments promote nanoparticle coalescence, while resistivity and long‐term stability are strongly dependent on cross‐sectional area. Optimized processing yields Au interconnects with widths down to and resistivity of . Integration with micromodular transistor circuits demonstrates that interconnect geometry and device interface quality strongly influence series resistance, and analysis of failure modes identifies strategies to improve reliability. These results establish a framework for designing electrically robust, high‐resolution printed interconnects, enabling reliable integration into next‐generation microelectronic packaging and hybrid interconnection technologies.
- 27 February 2026
- Published by Wiley in Advanced Materials Technologies
- Vol. 11 (11)
Open AccessCharacterization and Design Framework for Micro‐ and Nanoscale Printed Metal Interconnects in Hybrid Electronic Systems
High‐resolution printing offers promising avenues for packaging micro‐ and nanoscale modular electrical components, enabling hybrid, high‐performance circuits. The miniaturization of component interfaces imposes stringent requirements on printed interconnect resolution, conductivity, and structural robustness. This work systematically investigates the fabrication and characterization of submicron‐to‐micron scale (300 nm–3 ) metal nanoparticle interconnects, focusing on the interplay between printing parameters, multilayer deposition, and thermal sintering conditions. Silver (Ag) and gold (Au) colloidal inks are printed with controlled cross‐sectional geometries and sintered under dry air, forming gas, and nitrogen atmospheres. Correlations between geometry, sintering atmosphere, and interconnect resistivity reveal that oxygen‐rich and reducing environments promote nanoparticle coalescence, while resistivity and long‐term stability are strongly dependent on cross‐sectional area. Optimized processing yields Au interconnects with widths down to and resistivity of . Integration with micromodular transistor circuits demonstrates that interconnect geometry and device interface quality strongly influence series resistance, and analysis of failure modes identifies strategies to improve reliability. These results establish a framework for designing electrically robust, high‐resolution printed interconnects, enabling reliable integration into next‐generation microelectronic packaging and hybrid interconnection technologies.
- Open Access
- 16 June 2025
- Published by Elsevier in Additive Manufacturing
- Vol. 109
Automated desktop wiring of micromodular electronic systems with submicron electrohydrodynamic jet printed interconnects
- 16 June 2025
- Published by Elsevier in Additive Manufacturing
- Vol. 109
Open AccessAutomated desktop wiring of micromodular electronic systems with submicron electrohydrodynamic jet printed interconnects
- 28 April 2025
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 46 (7) , 1099-1102
Modular HfOx-RRAM for On-Demand Micromodular Electronics
Micromodular metal-HfOx-metal resistive random-access memories (RRAM) were fabricated, transferred to foreign substrates, and contacted using high-resolution electrohydrodynamic jet (e-jet) printing. The modular RRAM exhibited bipolar switching at low operating voltages and multi-level analog resistance states programmable using variable amplitude voltage pulses. These variable resistance RRAMs were also integrated with an amplifier and a bandpass filter to modulate their gain and corner frequencies. This work enables integration of high-quality RRAM devices in modular circuits and paves the way for microscale heterogeneous integration at the device level.
- 28 April 2025
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 46 (7) , 1099-1102
Modular HfOx-RRAM for On-Demand Micromodular Electronics
Micromodular metal-HfOx-metal resistive random-access memories (RRAM) were fabricated, transferred to foreign substrates, and contacted using high-resolution electrohydrodynamic jet (e-jet) printing. The modular RRAM exhibited bipolar switching at low operating voltages and multi-level analog resistance states programmable using variable amplitude voltage pulses. These variable resistance RRAMs were also integrated with an amplifier and a bandpass filter to modulate their gain and corner frequencies. This work enables integration of high-quality RRAM devices in modular circuits and paves the way for microscale heterogeneous integration at the device level.
- 20 September 2024
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 71 (11) , 7149-7155
Adaptive Interconnection of High-Performance Micromodular Silicon Transistors Using Electrohydrodynamic Jet Printing
Micromodular n-channel metal-oxide-silicon transistors were fabricated, transferred to a foreign substrate, and adaptively interconnected using high-resolution electrohydrodynamic jet (e-jet) printed metal wires to create depletion-load nMOS inverters. The transferred transistors have effective electron mobilities approaching 500 cm$^{{2}} \cdot $ V$^{-{1}} \cdot $ s−1 and subthreshold swing as low as 82 mV/decade, while the nMOS inverters have gains close to 30. Detailed electrical characterization shows that e-jet printing does not impact transistor performance. Moreover, e-jet printing can accommodate variations in transistor placement, opening the door to systems that can correct manufacturing errors in real-time. This work sets the stage for on-demand microelectronics manufacturing with extreme customizability at the transistor level.- 20 September 2024
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 71 (11) , 7149-7155
Adaptive Interconnection of High-Performance Micromodular Silicon Transistors Using Electrohydrodynamic Jet Printing
Micromodular n-channel metal-oxide-silicon transistors were fabricated, transferred to a foreign substrate, and adaptively interconnected using high-resolution electrohydrodynamic jet (e-jet) printed metal wires to create depletion-load nMOS inverters. The transferred transistors have effective electron mobilities approaching 500 cm$^{{2}} \cdot $ V$^{-{1}} \cdot $ s−1 and subthreshold swing as low as 82 mV/decade, while the nMOS inverters have gains close to 30. Detailed electrical characterization shows that e-jet printing does not impact transistor performance. Moreover, e-jet printing can accommodate variations in transistor placement, opening the door to systems that can correct manufacturing errors in real-time. This work sets the stage for on-demand microelectronics manufacturing with extreme customizability at the transistor level.- 30 August 2024
- Published by American Physical Society (APS) in Physical Review Materials
- Vol. 8 (8)
Magnetic anisotropy in single-crystalline antiferromagnetic- 30 August 2024
- Published by American Physical Society (APS) in Physical Review Materials
- Vol. 8 (8)
Magnetic anisotropy in single-crystalline antiferromagnetic