A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces

Authors:
  • FLFukun Li
    Fukun Li
  • YBYang Bai
    Yang Bai
  • HHHaiXiang Hu
    HaiXiang Hu
  • GQGuanbo Qiao
    Guanbo Qiao
  • LLLingzhong Li
    Lingzhong Li
  • FZFeng Zhang
    Feng Zhang
  • XZXuejun Zhang
    Xuejun Zhang

Abstract
No abstract available
Funding Information
  • National Key Research and Development Program of China (2022YFB3403405)
  • Natural Science Foundation of Jilin Province (SKL202302021)
  • National Natural Science Foundation of China (12203048)

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